Formation of TiN-based thin films on AISI M2 steel using the PVD technique

Keywords: Cathodic pulverization, Thin layers, Attrition

Abstract

The deposition of TiN thin films with a few nanometers thickness was carried out through reactive sputtering of a Ti target in an Ar+N atmosphere using a DC power supply. The deposited films were made on AISI M2 steel specimens cut from a 1 to 1.5” diameter bar with a maximum thickness of 8 mm. Finally, the TiN layers were characterized using various techniques including: Optical Microscopy (OM), Scanning Electron Microscopy (SEM) linked with Energy Dispersive Spectroscopy (EDS), Pin on disc and Scratch.

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References

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Published
2015-09-01
How to Cite
Gómez-Vargas, O., Oseguera-Peña, J., Ortiz-Domínguez, M., García-Macedo, J., Solís-Romero, J., Castellanos-Escamilla, V., Figueroa-López, U., Arenas-Flores, A., Barrientos-Hernández, F., & Cardoso-Legorreta, E. (2015). Formation of TiN-based thin films on AISI M2 steel using the PVD technique. Tópicos De Investigación En Ciencias De La Tierra Y Materiales, 2(2), 118-126. https://doi.org/10.29057/aactm.v2i2.9712